SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Base developable negative tone molecular resist based on epoxide cross-linking
Wallow, Thomas I., Hohle, Christoph K., Sharp, Brandon, Lawson, Richard A., Fralick, Ashten, Narcross, Hannah, Chun, Jun Sung, Neisser, Mark, Tolbert, Laren M., Henderson, Clifford L.Volume:
9425
Année:
2015
Langue:
english
DOI:
10.1117/12.2086039
Fichier:
PDF, 11.44 MB
english, 2015
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