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Metal–insulator transitions in (V1-xCrx)2O3 thin films deposited by reactive direct current magnetron co-sputtering
Querré, Madec, Janod, Etienne, Cario, Laurent, Tranchant, Julien, Corraze, Benoit, Bouquet, Valérie, Deputier, Stéphanie, Cordier, Stéphane, Guilloux-Viry, Maryline, Besland, Marie-PauleLangue:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2015.12.043
Date:
December, 2015
Fichier:
PDF, 1.90 MB
english, 2015