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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Exploration of the directed self-assembly based nano-fabrication design space using computational simulations
Latypov, Azat, Tong, William M., Resnick, Douglas J., Preil, Moshe, Schmid, Gerard, Xu, Ji, Yi, He, Yoshimoto, Kenji, Zou, YiVolume:
8680
Année:
2013
Langue:
english
DOI:
10.1117/12.2011238
Fichier:
PDF, 1.42 MB
english, 2013