SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - The effect of mask and source complexity on source mask optimization
Yang, Seung-Hune, Conley, Will, Jia, Ningning, Shim, SeongBo, Vengertsev, Dmitry, Choi, Jungdal, Kang, Ho-Kyu, Kim, Young-ChangVolume:
8683
Année:
2013
Langue:
english
DOI:
10.1117/12.2011993
Fichier:
PDF, 1.45 MB
english, 2013