SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Systematic studies on reactive ion etch-induced deformations of organic underlayers
Glodde, Martin, Allen, Robert D., Somervell, Mark H., Engelmann, Sebastian, Guillorn, Michael, Kanakasabapathy, Sivananda, Mclellan, Erin, Koay, Chiew-Seng, Yin, Yunpeng, Sankarapandian, MuthumanickamVolume:
7972
Année:
2011
Langue:
english
DOI:
10.1117/12.879442
Fichier:
PDF, 906 KB
english, 2011
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