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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - A systematic study of source error in source mask optimization
Alleaume, C., Yesilada, E., Farys, V., Depre, L., Arnoux, V., Li, Zhipan, Trouiller, Y., Serebriakov, A., Montgomery, M. Warren, Maurer, WilhelmVolume:
7823
Année:
2010
Langue:
english
DOI:
10.1117/12.864246
Fichier:
PDF, 665 KB
english, 2010