[IEEE 2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP) - Suzhou, China (2015.7.1-2015.7.3)] 2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP) - Double-layer resistive FSS structure for ultra-wideband microwave absorption
Shen, Yang, Li, Wenhui, Pang, Yongqiang, Pei, Zhibin, Qu, ShaoboAnnée:
2015
Langue:
english
DOI:
10.1109/IMWS-AMP.2015.7324946
Fichier:
PDF, 427 KB
english, 2015