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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends
Resnick, Douglas J., Bencher, Christopher, Latypov, Azat, Coskun, Tamer H., Garner, Grant, Preil, Moshe, Schmid, Gerard, Xu, Ji, Zou, YiVolume:
9049
Année:
2014
Langue:
english
DOI:
10.1117/12.2046082
Fichier:
PDF, 709 KB
english, 2014