Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates
Del Re, Ryan, Passarelli, James, Sortland, Miriam, Cardineau, Brian, Ekinci, Yasin, Buitrago, Elizabeth, Neisser, Mark, Freedman, Daniel A., Brainard, Robert L.Volume:
14
Langue:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.jmm.14.4.043506
Date:
November, 2015
Fichier:
PDF, 2.91 MB
english, 2015