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Film stress measurements for high temperature micromechanical and microelectronical applications based on SiC
K. Gottfried, J. Kriz, T. Werninghaus, M. Thümer, Ch. Kaufmann, D.R.T. Zahn, T. GeßnerVolume:
46
Année:
1997
Langue:
english
Pages:
5
DOI:
10.1016/s0921-5107(96)01957-5
Fichier:
PDF, 555 KB
english, 1997