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Characteristics of indium tin oxide films deposited by bias magnetron sputtering
Ch. Sujatha, G.Mohan Rao, S. UthannaVolume:
94
Année:
2002
Langue:
english
Pages:
5
DOI:
10.1016/s0921-5107(02)00090-9
Fichier:
PDF, 135 KB
english, 2002