[IEEE 2015 IFIP/IEEE International Conference on Very Large Scale Integration (VLSI-SoC) - Daejeon, South Korea (2015.10.5-2015.10.7)] 2015 IFIP/IEEE International Conference on Very Large Scale Integration (VLSI-SoC) - Flare reduction in EUV Lithography by perturbation of wire segments
Paul, Sudipta, Banerjee, Pritha, Sur-Kolay, SusmitaAnnée:
2015
Langue:
english
DOI:
10.1109/VLSI-SoC.2015.7314383
Fichier:
PDF, 737 KB
english, 2015
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