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Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography
Jiang, Zhong-Tao, Hong, Seungbum, Kim, Eunah, Bae, Byeong-Soo, No, Kwangsoo, Hwangbo, Chang Kwon, Lim, Sung-Chul, Woo, Sang-Gyun, Koh, Young-BumVolume:
11
Langue:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/11/10/016
Date:
October, 1996
Fichier:
PDF, 128 KB
english, 1996