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On the diffusion of Co in Si and its applicability to the Si intrinsic defect problem
Bergholz, WVolume:
14
Langue:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/14/6/018
Date:
June, 1981
Fichier:
PDF, 894 KB
english, 1981