(100)-Oriented 3C-SiC Polycrystalline Film Grown on SiO 2 by Hot-Mesh Chemical Vapor Deposition Using Monomethylsilane and Hydrogen
Narita, Yuzuru, Yasui, Kanji, Eto, Jumpei, Kurimoto, Taishi, Akahane, TadashiVolume:
44
Langue:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.44.l809
Date:
June, 2005
Fichier:
PDF, 402 KB
english, 2005