Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography
Taniguchi, Jun, Tokano, Yuji, Miyamoto, Iwao, Komuro, Masanori, Hiroshima, Hiroshi, Kobayashi, Kazuhiko, Miyazaki, Takeshi, Ohyi, HideyukiVolume:
39
Langue:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.39.7070
Date:
December, 2000
Fichier:
PDF, 1.29 MB
english, 2000