Quantitative depth profiling of SiOxNy layers on Si
J.G.M. van Berkum, M.J.P. Hopstaken, J.H.M. Snijders, Y. Tamminga, F.N. CubaynesVolume:
203-204
Année:
2003
Langue:
english
Pages:
4
DOI:
10.1016/s0169-4332(02)00691-8
Fichier:
PDF, 87 KB
english, 2003