
Selective Silicidation of Co Using Silane or Disilane for Anti-Oxidation Barrier Layer in Cu Metallization
Noda, Suguru, Hirai, Rika, Komiyama, Hiroshi, Shimogaki, YukihiroVolume:
43
Langue:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.6001
Date:
September, 2004
Fichier:
PDF, 378 KB
english, 2004