Some aspects of substrate pretreatment for epitaxial Si nanowire growth
Lugstein, A, Hyun, Y J, Steinmair, M, Dielacher, B, Hauer, G, Bertagnolli, EVolume:
19
Langue:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/19/48/485606
Date:
December, 2008
Fichier:
PDF, 1.06 MB
english, 2008