Fabrication and Characterization of Non-Doped SiO 2 Cladding Layer for Polarization-Insensitive Silica Waveguide by Using Plasma Enhanced Chemical Vapor Deposition
Ohkubo, Hiroyuki, Hongo, Akihito, Kashimura, Seiichi, Ohkawa, Masahiro, Ohira, Kentaro, Uetsuka, Hisato, Okano, HiroakiVolume:
42
Langue:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.42.4340
Date:
July, 2003
Fichier:
PDF, 182 KB
english, 2003