AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010 - Kyoto, (Japan) (6–11 June 2010)] - Two-Dimensional Cross-Sectional Doping Profile Study of Low Energy High Dose Ion Implantations Using High Vacuum Scanning Spreading Resistance Microscopy (HV-SSRM) and Electron Holography
Qin, Shu, Hu, Y. Jeff, McTeer, Allen, Fillmore, David, Lu, Shifeng, Burke, Rob, Guha, Jaydip, Vanhaeren, Danielle, Eyben, Pierre, Vandervorst, Wilfred, Matsuo, Jiro, Kase, Masataka, Aoki, Takaaki, SekAnnée:
2011
Langue:
english
DOI:
10.1063/1.3548345
Fichier:
PDF, 1.61 MB
english, 2011
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