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Atomic layer deposition of Al-incorporated Zn(O,S) thin films with tunable electrical properties
Park, Helen Hejin, Jayaraman, Ashwin, Heasley, Rachel, Yang, Chuanxi, Hartle, Lauren, Mankad, Ravin, Haight, Richard, Mitzi, David B., Gunawan, Oki, Gordon, Roy G.Volume:
105
Langue:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4901899
Date:
November, 2014
Fichier:
PDF, 927 KB
english, 2014