Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2014 / 03 Vol. 32; Iss. 2
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Polymethyl methacrylate/hydrogen silsesquioxane bilayer resist electron beam lithography process for etching 25 nm wide magnetic wires
Currivan, Jean Anne, Siddiqui, Saima, Ahn, Sungmin, Tryputen, Larysa, Beach, Geoffrey S. D., Baldo, Marc A., Ross, Caroline A.Volume:
32
Langue:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4867753
Date:
March, 2014
Fichier:
PDF, 4.83 MB
english, 2014