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Optimal Ge/SiGe nanofin geometries for hole mobility enhancement: Technology limit from atomic simulations
Vedula, Ravi Pramod, Mehrotra, Saumitra, Kubis, Tillmann, Povolotskyi, Michael, Klimeck, Gerhard, Strachan, AlejandroVolume:
117
Langue:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4919091
Date:
May, 2015
Fichier:
PDF, 4.79 MB
english, 2015