
Influence of Oxygen Pressure on Structures and Electrical Properties of Lead-free (K 0.44 Na 0.52 Li 0.04 )(Nb 0.86 Ta 0.10 Sb 0.04 )O 3 Thin Films Deposited by Pulsed Laser Deposition
Tian, Aifen, Ren, Wei, Shi, Peng, Wu, Xiaoqing, Chen, XiaofengVolume:
139
Langue:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584587.2012.735890
Date:
December, 2012
Fichier:
PDF, 433 KB
english, 2012