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Effect of hydrogen radical exposure on the interfacial and bulk structure of a-Si:H/a-SiNx:H multilayer films
Gaorong Han, Piyi Du, Jinhun Shou, Danmei ZhaoVolume:
334
Année:
1998
Langue:
english
Pages:
5
DOI:
10.1016/s0040-6090(98)01106-7
Fichier:
PDF, 66 KB
english, 1998