Hot-wire chemical vapor deposition (HWCVD) of fluorocarbon and organosilicon thin films
K.K.S Lau, H.G Pryce Lewis, S.J Limb, M.C Kwan, K.K GleasonVolume:
395
Année:
2001
Langue:
english
Pages:
4
DOI:
10.1016/s0040-6090(01)01287-1
Fichier:
PDF, 415 KB
english, 2001