
Plasma processed ultra-thin SiO2 interfaces for advanced silicon NMOS and PMOS devices: applications to Si-oxide/Si oxynitride, Si-oxide/Si nitride and Si-oxide/transition metal oxide stacked gate dielectrics
Gerald Lucovsky, Hanyang Yang, Yider Wu, Hiroake NiimiVolume:
374
Année:
2000
Langue:
english
Pages:
11
DOI:
10.1016/s0040-6090(00)01153-6
Fichier:
PDF, 487 KB
english, 2000