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Role of substrate bias during deposition of magnetron sputtered Ni, Ti and Ni–Ti thin films
Priyadarshini, B G, Kumar Gupta, M, Ghosh, S, Chakraborty, M, Aich, SVolume:
29
Langue:
english
Journal:
Surface Engineering
DOI:
10.1179/1743294413y.0000000182
Date:
October, 2013
Fichier:
PDF, 567 KB
english, 2013