
(Invited) Reliability Considerations of High-K Gate Dielectrics Deposited by Various Intermediate Treatment
Bhuyian, M., Misra, D.Volume:
60
Langue:
english
Journal:
ECS Transactions
DOI:
10.1149/06001.0103ecst
Date:
February, 2014
Fichier:
PDF, 321 KB
english, 2014