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Oxide via etching in a magnetically enhanced CHF3/CF4/Ar plasma
Byungwhan Kim, Sung-Ku KwonVolume:
47
Année:
2003
Langue:
english
Pages:
5
DOI:
10.1016/s0038-1101(03)00155-2
Fichier:
PDF, 94 KB
english, 2003