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The effects of NO passivation on the radiation response of SiO2/4H-SiC MOS capacitors
Tianbing Chen, Zhiyun Luo, John D Cressler, Tamara F Isaacs-Smith, John R Williams, Gilyong Chung, Steve D ClarkVolume:
46
Année:
2002
Langue:
english
Pages:
5
DOI:
10.1016/s0038-1101(02)00236-8
Fichier:
PDF, 286 KB
english, 2002