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ECS Transactions [ECS 219th ECS Meeting - Montreal, QC, Canada (May 1 - May 6, 2011)] - Development of Voltammetry-Based Techniques for Characterization of Porous Low-k/Cu Interconnect Integration Reliability
Kim, Choong-Un, Chen, LiangShan, Michael, Nancy, Bang, Woong Ho, Park, Young-Joon, Ryan, Todd E., King, SeanAnnée:
2011
Langue:
english
DOI:
10.1149/1.3572318
Fichier:
PDF, 1.14 MB
english, 2011