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[ECS 212th ECS Meeting - Washington, DC (October 7 - October 12, 2007)] ECS Transactions - Achievement of Higher-k and High-Φ in Phase Controlled HfO2 Film Using Post Gate Electrode Deposition Annealing
Watanabe, Yukimune, Ota, Hiroyuki, Migita, Shinji, Kamimuta, Yuuichi, Iwamoto, Kunihiko, Takahashi, Masashi, Ogawa, Arito, Ito, Hiromi, Nabatame, Toshihide, Toriumi, AkiraVolume:
11
Année:
2007
Langue:
english
DOI:
10.1149/1.2779546
Fichier:
PDF, 700 KB
english, 2007