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Comparison of the Electrical Properties of Poly-Si/Hf-Silicate Gate Stacks Fabricated by ALD Employing BDMAS and TDMAS Precursors
Kamiyama, Satoshi, Miura, Takayoshi, Nara, YasuoVolume:
153
Année:
2006
Langue:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2158570
Fichier:
PDF, 301 KB
english, 2006