Effect of Implantation Dose and Annealing Time on the Formation of Si Nanocrystals Embedded in Thermal Oxide
Qian, Cong, Zhang, Zheng-xuan, Zhang, Feng, Lin, Cheng-luVolume:
1020
Langue:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-1020-gg07-19
Date:
January, 2007
Fichier:
PDF, 67 KB
english, 2007