Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications
Papadatos, Filippos, Consiglio, Steve, Skordas, Spyridon, Eisenbraun, Eric T., Kaloyeros, Alain E., Peck, John, Thompson, David, Hoover, CynthiaVolume:
19
Langue:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.2004.0372
Date:
October, 2004
Fichier:
PDF, 1.16 MB
english, 2004