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[ECS 215th ECS Meeting - San Francisco, CA (May 24 - May 29, 2009)] ECS Transactions - Effect of Ceria Abrasives on Planarization Efficiency in STI CMP Process
Park, Boumyoung, Kim, Youngjin, Kim, Hyoungjae, Jeong, Haedo, Dornfeld, DavidAnnée:
2009
Langue:
english
DOI:
10.1149/1.3123774
Fichier:
PDF, 418 KB
english, 2009