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SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Optical/Laser Microlithography VIII - Implementation of i-line lithography to 0.30 um design rules
Kim, KeunYoung, Kim, Hung-Eil, Lee, Il-Ho, Kim, Jin-Soo, Chun, Jun-Sung, Hur, Ikboum, Moon, Seung-Chan, Baik, Ki-Ho, Choi, Soo-Han, Brunner, Timothy A.Volume:
2440
Année:
1995
Langue:
english
DOI:
10.1117/12.209286
Fichier:
PDF, 489 KB
english, 1995