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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Automated hotspot analysis with aerial image CD metrology for advanced logic devices
Ackmann, Paul W., Hayashi, Naoya, Buttgereit, Ute, Trautzsch, Thomas, Kim, Min-ho, Seo, Jung-Uk, Yoon, Young-Keun, Han, Hak-Seung, Chung, Dong Hoon, Jeon, Chan-Uk, Meyers, GaryVolume:
9235
Année:
2014
Langue:
english
DOI:
10.1117/12.2065937
Fichier:
PDF, 1000 KB
english, 2014