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Fabrication of Strain Relaxed Silicon-Germanium-on-Insulator (Si0.35Ge0.65OI) Wafers using Cyclical Thermal Oxidation and Annealing
Wang, Grace Huiqi, Toh, Eng-Huat, Tung, Chih-Hang, Foo, Yong-Lim, Tripathy, S., Lo, Guo-Qiang, Samudra, Ganesh, Yeo, Yee-ChiaVolume:
994
Langue:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0994-F09-03
Date:
January, 2007
Fichier:
PDF, 501 KB
english, 2007