SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Epoxidized novolac resist (EPR) for high-resolution negative- and positive-tone electron beam lithography
Tegou, Evangelia, Gogolides, Evangelos, Argitis, Panagiotis, Raptis, Ioannis, Patsis, George P., Glezos, Nikos, Tan, Zoilo C. H., Lee, Kim Y., Le, Phuong T., Hsu, Yautzong, Hatzakis, Michael, HoulihanVolume:
3999
Année:
2000
Langue:
english
DOI:
10.1117/12.388283
Fichier:
PDF, 709 KB
english, 2000