
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - High-speed atomic force microscopy for patterned defect review
Osborne, Jason, Hu, Shuiqing, Wang, Haiming, Hu, Yan, Shi, Jian, Hand, Sean, Su, Chanmin, Starikov, Alexander, Cain, Jason P.Volume:
8681
Année:
2013
Langue:
english
DOI:
10.1117/12.2011665
Fichier:
PDF, 472 KB
english, 2013