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Application of a macromolecular chelating agent in chemical mechanical polishing of copper film under the condition of low pressure and low abrasive concentration
Li, Yan, Liu, Yuling, Niu, Xinhuan, Bu, Xiaofeng, Li, Hongbo, Tang, Jiying, Fan, ShiyanVolume:
35
Langue:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/35/1/016001
Date:
January, 2014
Fichier:
PDF, 4.27 MB
english, 2014