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Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher
Kuppuswamy, Vijaya-Kumar Murugesan, Constantoudis, Vassilios, Gogolides, Evangelos, Pret, Alessandro Vaglio, Gronheid, RoelVolume:
12
Langue:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.12.2.023003
Date:
April, 2013
Fichier:
PDF, 4.78 MB
english, 2013