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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Optical Microlithography XXII - Birefringence issues with uniaxial crystals as last lens elements for high-index immersion lithography
Burnett, John H., Benck, Eric C., Kaplan, Simon G., Sirat, Gabriel Y., Mack, Chris, Levinson, Harry J., Dusa, Mircea V.Volume:
7274
Année:
2009
Langue:
english
DOI:
10.1117/12.814324
Fichier:
PDF, 2.20 MB
english, 2009