SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - EUV secondary electron blur at the 22nm half pitch node
Gronheid, Roel, Younkin, Todd R., Leeson, Michael J., Fonseca, Carlos, Hooge, Joshua S., Nafus, Kathleen, Biafore, John J., Smith, Mark D., La Fontaine, Bruno M., Naulleau, Patrick P.Volume:
7969
Année:
2011
Langue:
english
DOI:
10.1117/12.881427
Fichier:
PDF, 2.67 MB
english, 2011
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