[ECS 212th ECS Meeting - Washington, DC (October 7 - October 12, 2007)] ECS Transactions - Process and Electrical Characteristics of MO-ALD HfO2 Films for High-k Gate Applications Grown in a Production Worthy 300 mm Deposition System
Clark, Robert D., Wajda, Cory S., Leusink, Gert J., Edge, Lisa F., Faltermeier, Johnathan, Jamison, Paul, Linder, Barry P., Copel, Matthew, Narayanan, Vijay, Gribelyuk, Michael A., Loesing, Rainer, MuVolume:
11
Année:
2007
Langue:
english
DOI:
10.1149/1.2778650
Fichier:
PDF, 646 KB
english, 2007