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Efficient simulation of extreme ultraviolet multilayer defects with rigorous data base approach
Evanschitzky, Peter, Shao, Feng, Erdmann, AndreasVolume:
12
Langue:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.12.2.021005
Date:
March, 2013
Fichier:
PDF, 2.80 MB
english, 2013