Dielectric substrate self-bias and plasma confinement in two-dimensional scanning radio frequency plasma-enhanced chemical vapour deposition
Y. Yin, Y.Q. Pan, L. Hang, M.M.M. Bilek, D. McKenzie, S. RubanovVolume:
81
Année:
2006
Langue:
english
Pages:
5
DOI:
10.1016/j.vacuum.2006.05.014
Fichier:
PDF, 229 KB
english, 2006